Breakthrough in Deep UV MicroLED Display Chips for Maskless Photolithography Announced

A groundbreaking research team from the Hong Kong University of Science and Technology (HKUST), in collaboration with the Southern University of Science and Technology and the Suzhou Institute of Nanotechnology, has developed the world’s first deep ultraviolet (DUV) microLED display array for lithography machines. This innovation marks a significant step towards more cost-effective and efficient maskless photolithography, crucial for semiconductor manufacturing. The DUV microLED exhibits enhanced optical power density, rapid exposure times, and high resolution, addressing limitations associated with traditional mercury lamps and DUV LED light sources. Professor Hoi-Sing Kwok highlighted that this new microLED technology integrates ultraviolet light sources with pattern masks, paving the way for independent semiconductor equipment development. The research emphasizes the advantages of maskless lithography, including flexibility in exposure patterns and reduced costs. The team aims to further enhance this technology to produce high-resolution 2K to 8K DUV microLED displays. The findings have been published in Nature Photonics.

Breakthrough in Deep UV MicroLED Display Chips for Maskless Photolithography Announced

The Benefits of Transitioning to Clean Lighting for Everyone

Dame Maggie Aderin-Pocock Set to Inaugurate the 10th Annual Dark Skies Festival

2025’s Best LED Shop Lights for Your Garage

Catch a Glimpse of Venus, Saturn, Jupiter, and Mars Shining in January’s Night Sky – Here’s Your Guide