Engineering Researchers at HKUST Create Groundbreaking Innovation

Researchers at the Hong Kong University of Science and Technology (HKUST) have made a groundbreaking advancement in the semiconductor industry by developing the world’s first deep-ultraviolet (UVC) microLED display array aimed at enhancing lithography machines. Under the guidance of Professor KWOK Hoi-Sing, the team has successfully created a maskless lithography prototype capable of improving optical extraction efficiency and reducing production time through high power and light efficiency. Traditional lithography methods are hampered by issues such as size and energy consumption, which this new technology addresses. Their findings, published in the journal Nature Photonics, have been recognized as one of the top ten advancements in China’s third-generation semiconductor technology for 2024. Looking ahead, the team plans to further improve the prototype and develop high-resolution microLED display screens ranging from 2k to 8k.

Engineering Researchers at HKUST Create Groundbreaking Innovation

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