Groundbreaking Deep UV MicroLED Display Chips Created for Maskless Photolithography

Researchers at the Hong Kong University of Science and Technology (HKUST) have developed the world’s first deep ultraviolet (DUV) microLED display array for lithography machines, marking a significant advancement in semiconductor manufacturing technology. This innovative display leverages lower-cost maskless photolithography, capable of delivering sufficient light output power density for quick exposure of photoresist films, thus overcoming limitations associated with traditional mercury lamps and existing DUV LED sources. The collaborative project, which also involved the Southern University of Science and Technology and the Suzhou Institute of Nanotechnology, has resulted in high-efficiency devices that boast improved optical extraction, heat distribution, and stress relief in production. According to HKUST’s Hoi-Sing Kwok, this breakthrough offers a promising path forward for the independent development of semiconductor equipment. The research, published in Nature Photonics, aims to further enhance DUV microLED technology for high-resolution displays in the future.

Groundbreaking Deep UV MicroLED Display Chips Created for Maskless Photolithography

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