Groundbreaking Development of Deep UV Micro-LED Display Chips for Maskless Photolithography

Researchers from the Hong Kong University of Science and Technology (HKUST), in collaboration with the Southern University of Science and Technology and the Suzhou Institute of Nanotechnology, have developed the world’s first deep ultraviolet (DUV) micro-LED display array for use in lithography machines. This groundbreaking technology promises to enhance the efficiency and reduce the costs associated with maskless photolithography by providing sufficient optical power density for photopolymer exposure in shorter timeframes. Traditional methods, involving mercury lamps and DUV LEDs, grapple with challenges such as high energy consumption and low light efficiency. The new DUV micro-LED technology not only addresses these issues but also offers improved resolution and faster exposure times, representing a significant advancement in semiconductor manufacturing. The team aims to further optimize these DUV micro-LEDs and develop high-resolution display screens, marking a crucial step towards more independent semiconductor equipment development.

Groundbreaking Development of Deep UV Micro-LED Display Chips for Maskless Photolithography

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